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Contamination control for wafer container used within 300 mm manufacturing for power microelectronics

 
: Schneider, G.; Nguyen, T.Q.; Taubert, M.; Bounouar, J.; Le-Guet, C.; Leibold, A.; Richter, H.; Pfeffer, M.

:

Mertens, P.W.:
Ultra clean processing of semiconductor surfaces XIII : Selected, peer reviewed papers from the 13th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 12-14, 2016, Knokke, Belgium
Pfäffikon: Trans Tech Publications, 2016 (Diffusion and defect data. B, Solid state phenomena 255)
ISBN: 978-3-0357-1084-7
pp.381-386
International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) <13, 2016, Knokke-Heist>
English
Conference Paper
Fraunhofer IISB ()

Abstract
This paper gives an overview about all activities performed within a common project between industrial and academic partners to define clean room concepts for the first worldwide high volume semiconductor front end facility IFD for 300 mm power semiconductors. The investigation within this study is the base for the 300 mm container strategy resulting in new innovative manufacturing and automation concepts. © 2016 Trans Tech Publications, Switzerland.

: http://publica.fraunhofer.de/documents/N-422854.html