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Alternative high-resolution lithographic technologies for optical applications

 
: Zeitner, U.D.; Weichelt, T.; Bourgin, Y.; Kinder, R.

:

Erdmann, A. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Optical Microlithography XXIX. Proceedings : 23-25 February 2016, San Jose, California, United States
Bellingham, WA: SPIE, 2016 (Proceedings of SPIE 9780)
ISBN: 978-1-5106-0015-7
Art. 97800R
Conference "Optical Microlithography" <29, 2016, San Jose/Calif.>
English
Conference Paper
Fraunhofer IOF ()

Abstract
Modern optical applications have special demands on the lithographic fabrication technologies. This relates to the lateral shape of the structures as well as to their three dimensional surface profile. On the other hand optical nano-structures are often periodic which allows for the use of dedicated lithographic exposure principles. The paper briefly reviews actual developments in the field of optical nano-structure generation. Special emphasis will be given to two technologies: electron-beam lithography based on a flexible cell-projection method and the actual developments in diffractive mask aligner lithography. Both offer a cost effective fabrication alternative for high resolution structures or three-dimensional optical surface profiles.

: http://publica.fraunhofer.de/documents/N-422675.html