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2016
Conference Paper
Titel
Silicon oxynitride microdisk resonators for integrated waveguide coupling
Abstract
In this study we present a fully CMOS compatible process for the integration of microdisk resonators which enables a direct coupling to integrated waveguides. As wave guiding material silicon oxynitride is used which is deposited by plasma enhanced chemical vapor deposition. Structures are realized with optical lithography with subsequent reactive ion etching. The characterization is realized by evanescent field coupling of tapered fiber tips to excite whispering gallery modes in the microdisk resonator.