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Hierarchical Manipulation of Block Copolymer Patterns on 3D Topographic Substrates: Beyond Graphoepitaxy

: Park, S.; Cheng, X.; Böker, A.; Tsarkova, L.


Advanced Materials 28 (2016), No.32, pp.6900-6905
ISSN: 0935-9648
ISSN: 1521-4095
Journal Article
Fraunhofer IAP ()

Templates of complex nanopatterns in a form of hierarchically sequenced dots and stripes can be generated in block copolymer films on lithography-free 3D topographic substrates. The approach exploits thickness- and swelling-responsive morphological behavior of block copolymers, and demonstrates novel possibilities of topography-guided registration of nanopatterns due to periodic confinement and spontaneous orthogonal flow-fields.