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La-doped ZrO2 based Back End of Line (BEoL) decoupling capacitors

Poster presented at 16th International Conference on Atomic Layer Deposition 2016, July 24th - 27th, 2016, Dublin, Ireland
 
: Weinreich, Wenke; Seidel, Konrad; Polakowski, Patrick; Drescher, Maximilian; Gummenscheimer, A.; Nolan, M.G.; Cheng, L.; Triyoso, D.H.

2016, 1 Folie
International Conference on Atomic Layer Deposition <16, 2016, Dublin>
English
Poster
Fraunhofer IPMS ()
Anfrage beim Institut / Available on request from the institute bibliothek@ipms.fraunhofer.de

: http://publica.fraunhofer.de/documents/N-421243.html