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Development and characterization of a novel CoXN barrier film for future semiconductor technology nodes

 
: Dhavamani, Abitha
: Uhlig, Benjamin; Bartha, Johann Wolfgang

Dresden, 2015, VI, 79 pp. + Anhang
Dresden, TU, Master Thesis, 2015
English
Master Thesis
Fraunhofer IPMS ()

: http://publica.fraunhofer.de/documents/N-415107.html