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Patterning and Imaging with Electrons: Assessing Multi-Beam SEM for e-Beam Structured CMOS Samples

 
: Garbowski, Tomasz; Panteleit, Friedhelm; Dellemann, Gregor; Gutsch, Manuela; Hohle, Christoph; Reich, Elke; Rudolph, Matthias; Steidel, Katja; Thrun, Xaver; Zeidler, Dirk

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Sanchez, M.I. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Metrology, Inspection, and Process Control for Microlithography XXX : 22-25 February 2016, San Jose, California, United States
Bellingham, WA: SPIE, 2016 (SPIE Proceedings Series 9778)
ISBN: 978-1-5106-0013-3
Art. 97781V, 8 pp.
Conference "Metrology, Inspection, and Process Control for Microlithography" <30, 2016, San Jose/Calif.>
English
Conference Paper
Fraunhofer IPMS ()

: http://publica.fraunhofer.de/documents/N-414825.html