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Atmospheric pressure plasma deposition of a-C:H films in barrier discharges

 
: Klages, C.-P.; Thyen, R.; Vergöhl, M.

Davidson, J. L. ; Electrochemical Society -ECS-, Dielectric Science and Technology Division; Electrochemical Society -ECS-, High Temperature Materials Division:
Diamond materials. Proceedings of the Sixth International Symposium
Pennington, NJ: ECS, 2000 (Electrochemical Society. Proceedings 99,32)
ISBN: 1-566-77255-9
pp.64-71
International Symposium on Diamond Materials <6, 1999, Honolulu/Hawaii>
English
Conference Paper
Fraunhofer IST ()

Abstract
The plasma-activated deposition of amorphous hydrogenated carbon coatings at atmospheric pressure has been performed using dielectric barrier discharges. Ellipsometric and mechanical characterization of the films indicate a weakly crosslinked, polymer-like structure with low density and mechanical strength, compared to hard DLC coatings.

: http://publica.fraunhofer.de/documents/N-3981.html