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Polymer stamps for nanoimprinting

: Pfeiffer, K.; Fink, M.; Ahrens, G.; Gruetzner, G.; Reuther, F.; Seekamp, J.; Zankovych, S.; Torres, C.M.S.; Maximov, I.; Beck, M.; Graczy, M.; Montelius, L.; Schulz, H.; Scheer, H.-C.; Steingrüber, F.


Microelectronic engineering 61-62 (2002), No.1, pp.393-398
ISSN: 0167-9317
Journal Article
Fraunhofer HHI ()

Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments.