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High-temperature multilayers

 
: Yulin, S.; Benoit, N.; Feigl, T.; Kaiser, N.

:

Mackay, R.S. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Emerging lithographic technologies IX. Vol.2 : 1 - 3 March 2005, San Jose, California, USA
Bellingham/Wash.: SPIE, 2005 (SPIE Proceedings Series 5751)
ISBN: 0-8194-5731-0
pp.1155-1161
Conference "Emerging Lithographic Technologies" <9, 2005, San Jose/Calif.>
English
Conference Paper
Fraunhofer IOF ()
EUVL; interface-engineered multilayer; Mo/C/Si/C; Mo/Si; MoSi2/Si; thermal stability

Abstract
The effect of elevated temperatures on the optical and structural stability of MoSi2/Si and Mo/C/Si/C multilayer coatings was investigated. The multilayer mirrors were designed for normal-incidence reflectivity at a wavelength of about 13.5 nm. The multilayers were deposited by de-magnetron sputtering and subsequently annealed at temperatures of 400°C and 500°C for 1, 10 and 100 hours. X-ray scattering, transmission electron microscopy, atomic force microscopy and normal-incidence reflectivity measurements were used for the characterization of the multilayer structures. We achieved maximal normal-incidence reflectivities of 41.2 % and 59.6 % for as-deposited MoSi 2/S and Mo/C/Si/C multilayer mirrors. While the optical properties of Mo/C/Si/C multilayers changed monotonically during annealing time at temperatures of more than 400°C, the MoSi2/Si multilayers showed a superior thermal stability up to 500°C. New barrier layer materials were also suggested to enhance the thermal stability of Mo/Si multilayers. Interface-engineered Mo/Si multilayer mirrors were designed to combine both a high reflectivity of more than 60 % at 13.5 nm and a superior long-term thermal stability of up to 500°C.

: http://publica.fraunhofer.de/documents/N-38492.html