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Do we need complex resist models for predictive simulation of lithographic process performance?

 
: Tollkühn, B.; Erdmann, A.; Lammers, J.; Nolscher, C.; Semmler, A.

:

Sturtevant, J.L. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in resist technology and processing XXI. Vol.2 : 23 - 24 February 2004, Santa Clara, California, USA
Bellingham/Wash.: SPIE, 2004 (SPIE Proceedings Series 5376)
ISBN: 0-8194-5289-0
pp.983-994
Conference "Advances in Resist Technology and Processing" <21, 2004, Santa Clara/Calif.>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-38433.html