English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Konferenzschrift
Do we need complex resist models for predictive simulation of lithographic process performance?
Details
Full
Export
Statistics
Options
2004
Conference Paper
Titel
Do we need complex resist models for predictive simulation of lithographic process performance?
Author(s)
Tollkühn, B.
Erdmann, A.
Lammers, J.
Nolscher, C.
Semmler, A.
Hauptwerk
Advances in resist technology and processing XXI. Vol.2
Konferenz
Conference "Advances in Resist Technology and Processing" 2004
DOI
10.1117/12.534045
Language
English
google-scholar
View Details
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB