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Inorganic-organic hybrid materials for real 3-D sub-mum lithography

: Houbertz, R.; Schulz, J.; Fröhlich, L.; Domann, G.; Popall, M.; Serbin, J.; Chichkov, B.

Chrisey, D.B. ; Materials Research Society -MRS-:
Advanced optical processing of materials : Symposium held April 22 - 23, 2003, San Francisco, California, U.S.A. Papers presented at Symposium Y, held at the 2003 MRS spring meeting
Warrendale, Pa.: MRS, 2003 (Materials Research Society Symposium Proceedings 780)
ISBN: 1-558-99717-2
Symposium Y "Advanced Optical Processing of Materials" <2003, San Francisco/Calif.>
Materials Research Society (Spring Meeting) <2003, San Francisco/Calif.>
Conference Paper
Fraunhofer ISC ()

Real 3-D sub-m lithography was performed with two-photon polymerization (2PP) using inorganic-organic hybrid polymer (ORMOCER®) resins. The hybrid polymers were synthesized by hydrolysis/polycondensation reactions (modified sol-gel synthesis) which allows one to tailor their material properties towards the respective applications, i.e., dielectrics, optics or passivation. Due to their photosensitive organic functionalities, ORMOCER®s can be patterned by conventional photo-lithography as well as by femtosecond laser pulses at 780 nm. This results in polymerized (solid) structures where the non-polymerized parts can be removed by conventional developers. ORMOCER® structures as small as 200 nm or even below were generated by 2PP of the resins using femtosecond laser pulses. It is demonstrated that ORMOCER®s have the potential to be used in components or devices built up by nm-scale structures such as, e.g., photonic crystals. Aspects of the materials in conjunction to the applied technology are discussed.