• English
  • Deutsch
  • Log In
    Password Login
    Research Outputs
    Fundings & Projects
    Researchers
    Institutes
    Statistics
Repository logo
Fraunhofer-Gesellschaft
  1. Home
  2. Fraunhofer-Gesellschaft
  3. Konferenzschrift
  4. Inorganic-organic hybrid materials for real 3-D sub-mum lithography
 
  • Details
  • Full
Options
2003
Conference Paper
Title

Inorganic-organic hybrid materials for real 3-D sub-mum lithography

Abstract
Real 3-D sub-m lithography was performed with two-photon polymerization (2PP) using inorganic-organic hybrid polymer (ORMOCER®) resins. The hybrid polymers were synthesized by hydrolysis/polycondensation reactions (modified sol-gel synthesis) which allows one to tailor their material properties towards the respective applications, i.e., dielectrics, optics or passivation. Due to their photosensitive organic functionalities, ORMOCER®s can be patterned by conventional photo-lithography as well as by femtosecond laser pulses at 780 nm. This results in polymerized (solid) structures where the non-polymerized parts can be removed by conventional developers. ORMOCER® structures as small as 200 nm or even below were generated by 2PP of the resins using femtosecond laser pulses. It is demonstrated that ORMOCER®s have the potential to be used in components or devices built up by nm-scale structures such as, e.g., photonic crystals. Aspects of the materials in conjunction to the applied technology are discussed.
Author(s)
Houbertz, R.
Schulz, J.
Fröhlich, L.
Domann, G.
Popall, M.
Serbin, J.
Chichkov, B.
Mainwork
Advanced optical processing of materials  
Conference
Symposium Y "Advanced Optical Processing of Materials" 2003  
Materials Research Society (Spring Meeting) 2003  
Language
English
Fraunhofer-Institut für Silicatforschung ISC  
  • Cookie settings
  • Imprint
  • Privacy policy
  • Api
  • Contact
© 2024