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Verfahren zur Herstellung einer Entspiegelungssschicht auf einer Silikonoberfläche und optisches Element

Method for Producing an Antireflection Layer on a Silicone Surface and Optical Element
 
: Schulz, Ulrike; Rickelt, Friedrich; Munzert, Peter; Kaiser, Norbert

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Frontpage ()

DE 102014105939 A1: 20140428
German
Patent, Electronic Publication
Fraunhofer IOF ()

Abstract
A method for producing an antireflection layer on a silicone surface is described. The method includes application of an organic layer, production of a nanostructure in the organic layer by a plasma etching process, and application of at least one cover layer onto the nanostructure. An optical element can be produced by the method.

: http://publica.fraunhofer.de/documents/N-372158.html