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Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode
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2001
Journal Article
Titel
Suppression of boron penetration through thin gate oxides by nitrogen implantation into the gate electrode
Author(s)
Herden, M.
Bauer, A.J.
Beichele, M.
Ryssel, H.
Zeitschrift
Solid-State Electronics
DOI
10.1016/S0038-1101(00)00270-7
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB