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Electrodeposition of photoresist - optimization of deposition conditions, investigation of lithographic processes and chemical-resistance
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2000
Journal Article
Titel
Electrodeposition of photoresist - optimization of deposition conditions, investigation of lithographic processes and chemical-resistance
Author(s)
Schnupp, R.
Baumgärtner, R.
Kuhnhold, R.
Ryssel, H.
Zeitschrift
Sensors and Actuators. A
DOI
10.1016/S0924-4247(00)00344-7
Language
English
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Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB