In-situ Messung dünner Schichten auf Architekturglas

For the deposition of modern coatings on architectural glass (energy-saving, solar control, anti-reflective), reactive magnetron sputtering plays an outstanding role. The production of these coatings by reactive sputtering requires a manufactoring equipment, that ensures high quality as well as efficient deposition of the coatings. Thin film measurement by in-situ ellipsometry can very impressively used for monitoring and controlling the film properties, in particular in the case of more complex coatings. With regard to long-term stability the in-situ film measurement is of special importance with respect to the use of the novel mid-frequency magnetron sputter technique. This technique allows the deposition rate to be increased up to 500 %, however, a dynamical plasma stabilization in the so called "transition mode" is necessary. Within the framework of a project supported by the BMBF, the spectroscopic ellipsometry was implemented on a large scale glass deposition plant (Semco Gasbeschichtung, Neubrandenburg) and was tested during the production. The investigations show that ellipsometry is outstandingly suitable for an accurate determination of the optical layer properties of coatings on architecture glass, even for complex layer systems. Therefore, the basis for an improvement of the efficiency of the plant is given.