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Deposition of multilayer mirrors with arbitrary period thickness distributions

 
: Foltyn, T.; Braun, S.; Moss, M.; Leson, A.

:

Khounsary, A.M. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in mirror technology for x-ray, EUV lithography, laser, and other applications : 7 - 8 August 2003, San Diego, California, USA. Papers presented at the Conference on Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications held as part of the 48th annual meeting of SPIE's International Symposium on Optical Science and Technology
Bellingham/Wash.: SPIE, 2004 (SPIE Proceedings Series 5193)
ISBN: 0-8194-5066-9
pp.124-133
Conference on Advances in Mirror Technology for X-Ray, EUV Lithography, Laser, and Other Applications <2003, San Diego/Calif.>
International Symposium on Optical Science and Technology <48, 2003, San Diego/Calif.>
English
Conference Paper
Fraunhofer IWS ()

Abstract
In this paper we will describe a new approach for the deposition of multilayers with arbitrary period thickness distributions. The standard technique of magnetron sputter deposition has been extended to a design where a special mask with lateral varying particle transmission is placed in front of the substrate to be coated. Planar and curved substrates have been used to deposit multilayers with prescribed period thickness gradients. The realized laterally graded multilayer interference mirrors have been investigated by using X-ray and EUV-reflectometry. For the example of Mo/Si multilayers as normal incidence reflectors for EUV light at 13.5 nm it has been demonstrated that high-reflection multilayer mirrors can be deposited using the new deposition technique. Typical EUV reflectance of Mo/Si multilayer with carbon barrier layers are in the order of 70%. In addition, non-uniform masks have been used and several 1- and 2- dimensional period thickness gradients have been coated. The nominal thicknesses were compared with the actual values. Furthermore, steep gradients of the period thickness with thickness changes of typically 5% along a length of 5mm have been prepared and characterized.

: http://publica.fraunhofer.de/documents/N-35725.html