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Erratum: "On the location and stability of charge in SiO2/SiNx dielectric double layers used for silicon surface passivation" [Journal of Applied Physics (2014) 115 (144105)]

 
: Bonilla, R.S.; Reichel, C.; Hermle, M.; Wilshaw, P.R.

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Journal of applied physics 117 (2015), No.12, Art. 129901, 2 pp.
ISSN: 0021-8979
ISSN: 1089-7550
English
Journal Article
Fraunhofer ISE ()

: http://publica.fraunhofer.de/documents/N-352517.html