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Development of a precision positioning system for electron beam applications

: Mohaupt, M.; Harnisch, G.; Heidler, N.; Beckert, E.; Zerfas, P.; Eberhardt, R.; Tünnermann, A.; Döring, H.-J.; Heine, D.; Klein, M.

Shore, P. ; European Society for Precision Engineering and Nanotechnology -EUSPEN-:
12th International Conference of the European Society for Precision Engineering and Nanotechnology 2012. Proceedings. Vol.2 : June 4th - 7th 2012, Stockholm, Sweden
Bedford: Euspen, 2012
ISBN: 978-0-9566790-0-0
European Society for Precision Engineering and Nanotechnology (EUSPEN International Conference) <12, 2012, Stockholm>
Conference Paper
Fraunhofer IOF ()

The paper describes the mechanical design of a motorized x-y-positioning system for beam shaping elements in an electron beam lithography tool considering the special environmental requirements of the electron optical column. The results of characterization activities are discussed. A vacuum chamber developed for tests of differential pumping under conditions down to 10-5 Pa is described. The performance of the applied position measuring systems and the test setup in the vacuum chamber is characterized. Results of different performance tests of the positioning system are illustrated. Finally, challenges are discussed which are closely connected to the requirement of long term system stability.