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Particle generation during reactive magnetron sputtering of SiO2 with cylindrical and planar cathodes

: Vergöhl, M.; Rademacher, D.


Optical Society of America -OSA-, Washington/D.C.:
Optical Interference Coatings 2010. CD-ROM : Topical meeting and tabletop exhibit, June 6-11, 2010, Tucson, Arizona, USA. Technical digest
Washington, DC: OSA, 2010
ISBN: 978-1-55752-891-9
Paper TuD3
Optical Interference Coatings Topical Meeting and Tabletop Exhibit (OIC) <2010, Tucson/Ariz.>
Conference Paper
Fraunhofer IST ()

SiO2 layers were deposited by pulsed reactive magnetron sputtering with cylindrical and planar dual magnetrons. The particle density in SiO2 films deposited at different process parameters is analyzed.