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Analytical application of x-ray optical systems

 
: Dietsch, R.; Holz, T.; Braun, S.; Leisegang, T.; Meyer, D.C.

Verein Deutscher Ingenieure e.V. -VDI-, Kompetenzfeld Nanotechnik:
Nanofair 2005 - new ideas for industry : 4th International Nanotechnolgoy Symposium, November 29 - 30, 2005, Dresden
Düsseldorf: VDI-Verlag, 2005 (VDI-Berichte 1920)
ISBN: 3-18-091920-5
pp.85-89
International Nanotechnolgoy Symposium (Nanofair) <4, 2005, Dresden>
English
Conference Paper
Fraunhofer IWS ()

Abstract
To characterize the structural and morphological parameters of compact materials and thin films X-ray diffraction and X-ray reflectometry are widely used both on laboratory X-ray sources and on synchrotrons. The required beam characteristics which mostly depend on the real sample can be realized by various X-ray optical systems that produce either low divergence (high resolution) or high intensity beams. The actual developments tend to the design of customized systems using on or two dimensional beam shaping multilayer X-ray optics, multilayer monochromators or the combination of multilayer optics with other types of X-ray optics. A close interrelation of design, deposition, characterization and application is required to produce these tailored systems. The performance of special designed multilayer X-ray optics and monochromators is demonstrated at selected applications in X-ray diffraction (XRD and XRR) and X-ray fluorescence (XRF).

: http://publica.fraunhofer.de/documents/N-34341.html