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Multilayer optics development of EUV microscopy

: Braun, S.; Foltyn, T.; Loyen, L. van; Leson, A.; Walter, K.; Bergmann, K.; Neff, W.

Verein Deutscher Ingenieure e.V. -VDI-, Kompetenzfeld Nanotechnik:
Nanofair 2005 - new ideas for industry : 4th International Nanotechnolgoy Symposium, November 29 - 30, 2005, Dresden
Düsseldorf: VDI-Verlag, 2005 (VDI-Berichte 1920)
ISBN: 3-18-091920-5
International Nanotechnolgoy Symposium (Nanofair) <4, 2005, Dresden>
Conference Paper
Fraunhofer IWS ()
Fraunhofer ILT ()

The availability of sources and optics for the extreme ultraviolet (EUV) range opens up new perspectives for numerous applications beyond the EUV lithography. Laterally graded multilayers with rotational symmetry were deposited by using a new mask deposition technique. Grazing incidence collector was applied to collect the maximum intensity of an EUV gas discharge plasma source, that was coated with molybdenum by Pulsed Laser Deposition. That method enables the deposition of uniform and highly reflective molybdenum layers, which was protected against oxidation by using thin carbon top layers.