English
Deutsch
Log In
Password Login
or
Log in with Fraunhofer Smartcard
Research Outputs
Projects
Researchers
Institutes
Statistics
Fraunhofer-Gesellschaft
Home
Fraunhofer-Gesellschaft
Artikel
Alignment accuracy in a MA/BA8 GEN3 using substrate conformal imprint lithography (SCIL)
Details
Full
Export
Statistics
Options
2013
Journal Article
Titel
Alignment accuracy in a MA/BA8 GEN3 using substrate conformal imprint lithography (SCIL)
Author(s)
Fader, R.
Schömbs, U.
Verschuuren, M.
Zeitschrift
Süss Report
Externer Link
Externer Link
Language
English
google-scholar
View Details
Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB