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NANO-motheye antireflection pattern by plasma treatment of polymers

 
: Kaless, A.; Schulz, U.; Munzert, P.; Kaiser, N.

:

Plasma surface engineering, PSE 2004 : Proceedings of the Ninth International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Germany, September 13 - 17, 2004
Amsterdam: Elsevier, 2005 (Surface and coatings technology 200.2005,1/4)
pp.58-61
International Conference on Plasma Surface Engineering (PSE) <9, 2004, Garmisch-Partenkirchen>
English
Conference Paper, Journal Article
Fraunhofer IOF ()

Abstract
The application of plasma treatment on transparent PMMA substrates has shown an effect of reducing surface reflection. This effect is based on a refractive index gradient created by a combination of chemical decomposition and physical etching on the polymer surface. A stochastic nanostructure was found by means of AFM and SEM. Conditions for the plasma treatment process and properties of the modified PMMA surfaces have been discussed.

: http://publica.fraunhofer.de/documents/N-33586.html