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Structure placement accuracy of wafer level stamps for substrate conformal imprint lithography

Poster presented at NNT 2014, 13th International Conference on Nanoimprint and Nanoprint Technology, Kyoto, Japan, October 22-24, 2014
 
: Fader, Robert; Förthner, Michael; Rumler, Maximilian; Rommel, Mathias; Bauer, Anton J.; Frey, Lothar; Verschuuren, Marc; Butschke, Jörg; Irmscher, Mathias; Storace, Eleonora; Ji, Ran; Schömbs, Ulrike

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Poster urn:nbn:de:0011-n-3331170 (2.7 MByte PDF)
MD5 Fingerprint: e916a0f1b29938b4a41a20d95d0b9c81
Created on: 10.4.2015


2014, 1 Folie
International Conference on Nanoimprint and Nanoprint Technology (NNT) <13, 2014, Kyoto>
English
Poster, Electronic Publication
Fraunhofer IISB ()
nanoimprint; SCIL

: http://publica.fraunhofer.de/documents/N-333117.html