Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Spectroscopic techniques for characterization of high-mobility strained-Si CMOS

: Schmidt, J.; Vogg, G.; Bensch, F.; Kreuzer, S.; Ramm, P.; Zollner, S.; Liu, R.; Wennekers, P.


Kasper, E.:
Second International SiGe Technology and Device Meeting, ISTDM 2004. Proceedings : Kleist-Forum, Frankfurt (Oder), Germany, 16 - 19 May: From materials and process technology to device and circuit design
Oxford: Pergamon, 2005 (Materials science in semiconductor processing 8.2005, 1/3)
International SiGe Technology and Device Meeting (ISTDM) <2, 2004, Frankfurt/Oder>
Conference Paper, Journal Article
Fraunhofer IZM ()