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Measurement data evaluation for in situ single-wavelength ellipsometry during reactive ion etching

Presentation held at the 5th European AEC/APC Conference. Dresden, Germany, April 14-16, 2004
 
: Roeder, G.; Schneider, C.; Pfitzner, L.; Ryssel, H.

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Fulltext urn:nbn:de:0011-n-329873 (633 KByte PDF)
MD5 Fingerprint: f77e710a36a16852046c9a5d77b645e6
Created on: 28.10.2005


2004, 16 pp.
European Advanced Equipment Control / Advanced Process Control Conference (AEC/APC Europe) <5, 2004, Dresden>
English
Presentation, Electronic Publication
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-32987.html