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Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems

 
: Fühner, T.; Erdmann, A.; Farkas, R.; Tollkühn, B.; Kokai, G.

Raidl, G.R.:
Applications of evolutionary computing : EvoWorkshops 2004: EvoBIO, EvoCOMNET, EvoHOT, EvoIASP, EvoMUSART, and EvoSTOC, Coimbra, Portugal, April 5 - 7, 2004; Proceedings
Berlin: Springer, 2004 (Lecture Notes in Computer Science 3005)
ISBN: 3-540-21378-3
ISSN: 0302-9743
pp.208-218
European Workshop on Evolutionary Bioinformatics (EvoBIO) <2, 2004, Coimbra>
European Workshop on Evolutionary Computation in Communications, Networks, and Connect Systems (EvoCOMNET) <1, 2004, Coimbra>
European Workshop on Hardware Optimization Techniques (EvoHOT) <1, 2004, Coimbra>
European Workshop on Evolutionary Computation in Image Analysis and Signal Processing (EvoIASP) <6 2004, Coimbra>
European Workshop on Evolutionary Music and Art (EvoMUSART) <2, 2004, Coimbra>
European Workshop on Evolutionary Algorithms in Stochastic and Dynamic Environments (EvoSTOC) <1, 2004, Coimbra>
English
Conference Paper
Fraunhofer IISB ()

Abstract
This paper proposes the use of a genetic algorithm to optimize mask and illumination geometries in optical projection lithography. A fitness function is introduced that evaluates the imaging quality of arbitrary line patterns in a specified focus range. As a second criterion the manufacturability and inspectability of the mask are taken into account. With this approach optimum imaging conditions can be identified without any additional a-priori knowledge of the lithographic process. Several examples demonstrate the successful application and further potentials of the proposed concept.

: http://publica.fraunhofer.de/documents/N-32684.html