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High-k hafnium silicate films on silicon and germanium wafers by MOCVD using a single-source precursor

 
: Lemberger, M.; Schön, F.; Dirnecker, T.; Jank, M.P.M.; Paskaleva, A.; Bauer, A.J.; Frey, L.; Ryssel, H.

Devi, A. ; Electrochemical Society -ECS-, High Temperature Materials Division:
Fifteenth European Conference on Chemical Vapor Deposition, EUROCVD-15. Proceedings : held from 5th to 9th September 2005 in Bochum, Germany
Pennington, NJ: ECS, 2005 (Electrochemical Society. Proceedings 2005-9)
ISBN: 1-566-77427-6
pp.873-880
European Conference on Chemical Vapor Deposition (EUROCVD) <15, 2005, Bochum>
English
Conference Paper
Fraunhofer IISB ()

: http://publica.fraunhofer.de/documents/N-32528.html