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Advances in lithography: Introduction to the feature. Editorial

 
: Erdmann, A.; Liang, R.G.; Sezginer, A.; Smith, B.

:

Journal of the Optical Society of America. A, Optics, image science, and vision 31 (2014), No.12, pp.L11-L12
ISSN: 1084-7529
ISSN: 0740-3232
ISSN: 1520-8532
English
Journal Article
Fraunhofer IISB ()

Abstract
Optical projection lithography has been the key technology for the ongoing miniaturization in semiconductor devices over the past 40 years. This issue features original research covering mask and image modeling methods and computational techniques for various inverse problems in advanced lithography, including source and mask optimization, wavefront retrieval, and design of Fresnel lenses.

: http://publica.fraunhofer.de/documents/N-324327.html