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Large-area honeycomb texturing of Si-solar cells via nanoimprint lithography

: Tucher, N.; Volk, A.; Seiffe, J.; Hauser, H.; Müller, C.; Bläsi, B.

Fulltext urn:nbn:de:0011-n-3241393 (557 KByte PDF)
MD5 Fingerprint: 68b54da1f2ada924cdb42e290602f0d5
Created on: 6.2.2015

Bokhoven, T.P. ; European Commission:
29th European Photovoltaic Solar Energy Conference and Exhibition, EU PVSEC 2014 : Proceedings of the international conference held in Amsterdam, The Netherlands, 22 - 26 September 2014, DVD
München: WIP, 2014
ISBN: 3-936338-34-5
European Photovoltaic Solar Energy Conference and Exhibition (EU PVSEC) <29, 2014, Amsterdam>
Conference Paper, Electronic Publication
Fraunhofer ISE ()
Solarthermie und Optik; Silicium-Photovoltaik; Oberflächen: Konditionierung; Passivierung; Lichteinfang

The highest solar cell efficiencies on mc-Si were realized using photolithographically defined texturing processes. The feasibility of fabricating honeycomb textures using Nanoimprint Lithography (NIL) was already demonstrated and excellent short-circuit current densities of up to 40.7 mA/cm² were achieved on small-area monocrystalline silicon (c-Si) solar cells. In the present work, large-area honeycomb texturing of multicrystalline silicon (mc-Si) substrates based on Roller-NIL and in-line-capable multi-wafer plasma etching using a modified Roth&Rau SiNA system is demonstrated. The realized honeycomb texture shows superior optical properties compared to isotextured mc-Si reference samples and even random pyramids on c-Si substrates, while surface passivation is comparably good. The fabricated 156 x 156 mm² mc-Si solar cells with Al-BSF show an efficiency of 17.8% compared to 17.3% of the isotextured reference. As VOC remains constant for both textures, the efficiency gain of 0.5% absolute results from a Jsc increase of up to 1.3 mA/cm2 (on cut 50 x 50 mm² cells even 2.5 mA/cm2), which confirms the superior optical quality of the honeycomb texture.