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PECVD Al2O3 for Surface Passivation: A Review of Solar Cell and Thin Layer Characteristics Silicon Solar Cell

 
: Kühnhold, S.; Saint-Cast, P.; Hofmann, M.; Paramanathan, R.; El-Safoury, M.; Kafle, B.; Kania, D.; Weiss, L.; Heo, Y.-H.; Billot, E.; Olwal, P.; Rentsch, J.; Preu, R.

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WIP - Renewable Energies, München:
1st Africa Photovoltaic Solar Energy Conference and Exhibition 2014. Proceedings : Durban, South Africa, 27.03.2014-29.03.2014
München: WIP-Renewable Energies, 2014
ISBN: 978-88-89407-103
pp.6-10
Africa Photovoltaic Solar Energy Conference and Exhibition (Africa PVSEC) <1, 2014, Durban>
English
Conference Paper
Fraunhofer ISE ()
PV Produktionstechnologie und Qualitätssicherung; Silicium-Photovoltaik; Oberflächen: Konditionierung; Passivierung; Lichteinfang; Passivation; PECVD; PERC; Aluminiumoxide; Al2O3

Abstract
A review about Al2O3 surface passivation for Si solar cell applications is presented. Whereat, a focus to the industrially relevant deposition technique PECVD is given. Al2O3 was already adapted to several cell concepts including PERC, PERT, TOPCon, EWT and IBC. Latest record cell efficiencies using Al2O3 passivation are summarized in this publication. Further, the passivation mechanism and the structure of Al2O3 are discussed in detail.

: http://publica.fraunhofer.de/documents/N-319887.html