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2011
Conference Paper
Titel
Simulation of plasma deposition processes
Abstract
In order to meet the requirements for efficient further development of vacuum deposition technology, we developed a parallel, Particle-in-Cell Monte-Carlo (PIC-MC) simulation framework for description of rarefied gas flows and gas discharges. With this tool a large variety of low-pressure and/or plasma-based deposition techniques can be addressed. This work gives an introduction into the basic principles of PIC-MC simulation and demonstrates its application on magneton sputtering.