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Plasmonic nanoring fabrication tuned to pitch: Efficient, deterministic, and large scale realization of ultra-small gaps for next generation plasmonic devices

: Lehr, Dennis; Alaee, Rasoul; Filter, Robert; Dietrich, Kay; Siefke, Thomas; Rockstuhl, Carsten; Lederer, Falk; Kley, Ernst-Bernhard; Tünnermann, Andreas


Applied Physics Letters 105 (2014), No.14, Art. 143110, 5 pp.
ISSN: 0003-6951 (Print)
ISSN: 1077-3118
ISSN: 1931-9401 (online)
Journal Article
Fraunhofer IOF ()
plasmonic devices; ultra-small

A double-patterning process for scalable, efficient, and deterministic nanoring array fabrication is presented. It enables gaps and features below a size of 20nm. A writing time of 3min/cm2 makes this process extremely appealing for scientific and industrial applications. Numerical simulations are in agreement with experimentally measured optical spectra. Therefore, a platform and a design tool for upcoming next generation plasmonic devices like hybrid plasmonic quantum systems are delivered.