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157 nm and 193 nm scatter, R and T measurement technique

 
: Gliech, S.; Gessner, H.; Hultaker, A.; Duparre, A.

:

Amra, C. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in optical thin films : 30 September - 3 October 2003, St. Etienne, France
Bellingham/Wash.: SPIE, 2004 (SPIE Proceedings Series 5250)
ISBN: 0-8194-5134-7
pp.137-145
Conference "Advances in Optical Thin Films" <2003, St. Etienne>
English
Conference Paper
Fraunhofer IOF ()

: http://publica.fraunhofer.de/documents/N-31230.html