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Large Area Sputtering of Dielectric and Infrared Blocking Layer Stacks on Flexible Glass

 
: Junghähnel, Manuela; Garner, Sean; Preußner, Thomas; Günther, Steffen; Cimo, P.

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Society of Vacuum Coaters -SVC-, Albuquerque/NM:
Society of Vacuum Coaters. 57th Annual Technical Conference 2014 : Chicago, USA, 03. - 09. Mai 2014
Albuquerque: SVC, 2014
ISBN: 978-1-878068-34-7
pp.166-170
Society of Vacuum Coaters (Annual Technical Conference) <57, 2014, Chicago/Ill.>
English
Conference Paper
Fraunhofer FEP ()
flexible glass; PVD

Abstract
Ultra-slim flexible glass as a new substrate material open sa wide range of new application fields. For electronic applications (e.g. displays), flexible glass enables utilization in thin, light, robust, curved, and conformable devices. Beside the challenge of the substrate handling, the functionalization of the surface by thin films using PVD deposition methods also has to be adjusted for further processing of a device. The thermal and dimensional stability of the coated substrate influences device fabrication and processing. Flexible alkali-free borosilicate glass, with a thickness of 100 μm with a dimension of 250 x 300 mm², was used in magnetron sputtering deposition under pilot scale conditions in an in-line sputtering plant, which normally is used for rigid glass substrates (3 to1 0 mm). We have investigated the applicability of large area thin-film coatings on flexible glass using high deposition rate sputtering processes with planar and tubular targets with a maximum length of 900 mm. We prepared several functional layer stacks on flexible glass, such as anti-reflective coatings and infrared-blocking coatings. The influences of selected process parameters for high-deposition rate sputtering of titania and silica on the film- and substrate-stress have been investigated. The results were compared with investigations on flexible PET substrates. The focus of the work is finding critical parameters of thin-film sputter deposition for an improved handling and performance of flexible glass in existing thin-film coating equipment.

: http://publica.fraunhofer.de/documents/N-311299.html