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Vorrichtung und Verfahren zur Erzeugung einer EUV- und/oder weicher Röntgenstrahlung

Device for generating extreme UV (EUV) radiation/soft X-ray radiation, has electron beam source that is arranged in such a manner so that electron beam is stroked to discharge plasma to generate portion of EUV and/or X-ray radiation
 
: Bergmann, Klaus

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Frontpage ()

DE 102013001940 A1: 20130205
German
Patent, Electronic Publication
Fraunhofer ILT ()

Abstract
The generating device has two opposing electrodes between a gas discharge is ignited by applying an electric voltage of a high voltage source (5) to generate a discharge plasma (6). An electron beam source is separated from the discharge plasma and arranged in such a manner so that the electron beam (10) generated by the electron beam source is stroked to the discharge plasma for generating a portion the EUV and/or X-ray radiation. An independent claim is included for a method for generating EUV radiation and/or soft X-ray radiation.

: http://publica.fraunhofer.de/documents/N-311178.html