Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Reactive high rate D.C. sputtering: Deposition rate, stoichiometry and features of TiOx and TiNx films with respect to the target mode
| Thin solid films 111 (1984), No.3, pp.259-268
ISSN: 0040-6090 |
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| English |
| Journal Article |
| Fraunhofer FEP () |