Publica
Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten. Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics
| Fifth Symposium on Ion Sources and Ion Assisted Technology and International Workshop on Ion Based Techniques for Film Formation 1981. Papers : Tokyo and Kyoto, Japan, June 1 - 5, 1981
Lausanne: Elsevier Sequoia, 1982 (Thin solid films 92.1982,1-2)
pp.81-98 |
| Symposium on Ion Sources and Ion Assisted Technology <5, 1981, Tokyo>
International Workshop on Ion Based Techniques for Film Formation <1981, Tokyo> |
|
| English |
| Conference Paper, Journal Article |
| Fraunhofer FEP () |