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Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics
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1982
Conference Paper
Titel
Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics
Author(s)
Schiller, S.
Heisig, U.
Goedicke, K.
Bilz, H.
Steinfelder, K.
Hauptwerk
Fifth Symposium on Ion Sources and Ion Assisted Technology and International Workshop on Ion Based Techniques for Film Formation 1981. Papers
Konferenz
Symposium on Ion Sources and Ion Assisted Technology 1981
International Workshop on Ion Based Techniques for Film Formation 1981
DOI
10.1016/0040-6090(82)90190-0
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP