Fraunhofer-Gesellschaft

Publica

Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

Methods and applications of plasmatron high rate sputtering in microelectronics, hybrid microelectronics and electronics

 
: Schiller, S.; Heisig, U.; Goedicke, K.; Bilz, H.; Steinfelder, K.

:

Fifth Symposium on Ion Sources and Ion Assisted Technology and International Workshop on Ion Based Techniques for Film Formation 1981. Papers : Tokyo and Kyoto, Japan, June 1 - 5, 1981
Lausanne: Elsevier Sequoia, 1982 (Thin solid films 92.1982,1-2)
pp.81-98
Symposium on Ion Sources and Ion Assisted Technology <5, 1981, Tokyo>
International Workshop on Ion Based Techniques for Film Formation <1981, Tokyo>
English
Conference Paper, Journal Article
Fraunhofer FEP ()

: http://publica.fraunhofer.de/documents/N-30221.html