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Reaktive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films
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1979
Journal Article
Titel
Reaktive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films
Author(s)
Schiller, S.
Heisig, U.
Steinfelder, K.
Strümpfel, J.
Zeitschrift
Thin solid films
DOI
10.1016/0040-6090(79)90042-7
Language
English
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Fraunhofer-Institut für Organische Elektronik, Elektronenstrahl- und Plasmatechnik FEP