Hier finden Sie wissenschaftliche Publikationen aus den Fraunhofer-Instituten.

The double ring magnetron process module - a tool for stationary deposition of metals, insulators and reactive sputtered compounds

: Frach, P.; Gottfried, C.; Bartzsch, H.; Goedicke, K.


Surface and coatings technology 90 (1997), No.1-2, pp.75-81
ISSN: 0257-8972
Journal Article
Fraunhofer FEP ()

The double ring magnetron module has become a powerful tool for solving a great variety of thin film deposition tasks in the field of stationary sputter deposition of substrates in the diameter range of 200 mm at high deposition rates. Different variants of powering - DC, MF (50kHz) and RF (13.56 MHz) - that allow to sputter conductive and insulating materials will be compared. In reactive sputtering new solutions for magnetron design, reactive gas inlet, power input and control systems will be reported, that guarantee during the target life time the stable, reproducible and uniform deposition of materials like SiO2 or Al2O3.