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Low-scatter HfO2/SiO2 multilayer enhanced mirror for 1064 nm

: Wang, J.; Schreiber, H.; Schröder, S.; Hauptvogel, M.; Duparré, A.


Optical Society of America -OSA-, Washington/D.C.:
Optical Interference Coatings (OIC) 2013. OSA Topical Meeting. Technical digest. CD-ROM : 16 - 21 June 2013, Whistler, British Columbia, Canada
Washington, DC: OSA, 2013
ISBN: 978-1-55752-970-1
Paper TC.6
Topical Meeting "Optical Interference Coatings" (OIC) <2013, Whistler>
Conference Paper
Fraunhofer IOF ()

HfO2/SiO2 multilayers were deposited on commercial silicon substrates. Angular resolved scatter measurement was performed at 1064 nm. Total backscattering and near angle scattering (0.5° to 2°) were determined to be 10-4 and 10-5, respectively.