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An inverted cylindrical sputter magnetron as metal vapor supply for electron cyclotron resonance ion sources

: Weichsel, Tim; Hartung, Ullrich; Kopte, Torsten; Zschornack, G.; Kreller, M.; Silze, A.


Review of scientific instruments 85 (2014), No.5, Art.053301, 11 pp.
ISSN: 0034-6748
ISSN: 1089-7623
Journal Article
Fraunhofer FEP ()

An inverted cylindrical sputter magnetron device has been developed. The magnetron is acting as a metal vapor supply for an electron cyclotron resonance (ECR) ion source. FEM simulation of magnetic flux density was used to ensure that there is no critical interaction between both magnetic fields of magnetron and ECR ion source. Spatially resolved double Langmuir probe and optical emission spectroscopy measurements show an increase in electron density by one order of magnitude from 1 ×1010 cm−3 to 1 × 1011 cm−3, when the magnetron plasma is exposed to the magnetic mirror field of the ECR ion source. Electron density enhancement is also indicated by magnetron plasma emission photography with a CCD camera. Furthermore, photographs visualize the formation of a localized loss-cone - area, when the magnetron is operated at magnetic mirror field conditions. The inverted cylindrical magnetron supplies a metal atom load rate of R > 1 × 1018 atoms/s for aluminum, which meets the demand for the production of a milliampere Al+ ion beam.