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Introduction of an innovative water based photoresist stripping process using intelligent fluids

 
: Rudolph, Matthias; Felten, Peter; Thrun, Xaver; Schumann, Dirk; Esche, Silvio; Hohle, Christoph

:

Wallow, T.I. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Patterning Materials and Processes XXXI : San Jose, California, USA; February 2014
Bellingham: SPIE, 2014 (Proceedings of SPIE 9051)
ISBN: 978-0-8194-9974-5
Paper 90510T, 10 pp.
Conference "Advances in Patterning Materials and Processes" <31, 2014, San Jose/Calif.>
English
Conference Paper
Fraunhofer IPMS ()

Abstract
The usage of phasefluid based stripping agents to remove photoresists from silicon substrates was studied. Due to their highly dynamic inner structure phasefluids offer a new working principle, they are penetrating layers through smallest openings and lift off the material from the surface. These non-aggressive stripping fluids were investigated regarding their cleaning efficiency as well as contamination behavior to enable usage in semiconductor and MEMS manufacturing. A general proof of concept for the usage of phasefluids in resist stripping processes is shown on silicon coupons and BKM’s are given for different resist types. In addition a baseline process on 12inch wafers has been developed and characterized in terms of metallic and ionic impurities and defect level.

: http://publica.fraunhofer.de/documents/N-298185.html