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Title
Substrate with gas barrier layer system, comprises substrate, plasma polymer layer as first barrier layer, plasma polymer intermediate layer, and plasma polymer layer arranged on intermediate layer on the side facing away from substrate
Date Issued
2012
Patent No
102011005234
Abstract
Substrate with gas barrier layer system comprises: a substrate (1); a plasma polymer layer deposited on the substrate as a first barrier layer (2), which has a permeability to oxygen of = 5 cm 3>/(m 2>x d x bar); a plasma polymer intermediate layer (3) arranged on the first barrier layer; and a plasma polymer layer arranged on the intermediate layer on the side facing away from the substrate as a second barrier layer (4) having a permeability to oxygen of = 5 cm 3>/(m 2>x dx bar). Substrate with gas barrier layer system comprises: a substrate (1); a plasma polymer layer deposited on the substrate as a first barrier layer (2), which has a permeability to oxygen of = 5 cm 3>/(m 2>x d x bar); a plasma polymer intermediate layer (3) arranged on the first barrier layer; and a plasma polymer layer arranged on the intermediate layer on the side facing away from the substrate as a second barrier layer (4) having a permeability to oxygen of = 5 cm 3>/(m 2>x dx bar), where the plasma polymer intermediate layer comprises (i) silicon (20-25 atom%, based on total number of silicon, carbon and oxygen), carbon (30-60 atom%, based on total number of silicon, carbon and oxygen), oxygen (20-35 atom%, based on total number of silicon, carbon and oxygen) and hydrogen, (ii) carbon (70-90 atom%, based on total number of carbon and oxygen), oxygen (10-30 atom%, based on total number of carbon and oxygen) and hydrogen. An independent claim is also included for preparing the substrate having the gas barrier coating system, comprising providing the substrate, depositing the first barrier layer, intermediate layer and the second barrier layer.
Language
de
Patenprio
DE 102011005234 A: 20110308