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Device for producing silicon blocks, comprises vessel, which is provided to receive silicon melt and has bottom, inner side, outer side and middle-longitudinal axis, supporting plate, and unit for generating inhomogeneous temperature field

 
: Freudenberg, B.; Radel, G.; Trempa, M.; Dadzis, K.; Dietrich, M.; Nauert, D.; Proske, S.; Reimann, C.; Friedrich, J.

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Frontpage ()

DE 102010014724 A: 20100412
German
Patent, Electronic Publication
Fraunhofer IISB ()

Abstract
The device (1) for producing silicon blocks, comprises a vessel (2), which is provided for receiving a silicon melt and has a bottom (4), an inner side (6), an outer side (7) and a middle-longitudinal axis, a supporting plate (3), which indirectly contacts with the bottom in an area-wise manner and forms a base together with the bottom, and a unit for generating an inhomogeneous temperature field at the inner side of the bottom. The base has an inhomogeneous heat transfer coefficient. The supporting plate has two areas with different heat transfer coefficients.; The device (1) for producing silicon blocks, comprises a vessel (2), which is provided for receiving a silicon melt and has a bottom (4), an inner side (6), an outer side (7) and a middle-longitudinal axis, a supporting plate (3), which indirectly contacts with the bottom in an area-wise manner and forms a base together with the bottom, and a unit for generating an inhomogeneous temperature field at the inner side of the bottom. The base has an inhomogeneous heat transfer coefficient. The supporting plate has two areas with different heat transfer coefficients, and has an inhomogeneous thickness DT x y. The bottom has a homogeneous thickness DB. The base has several recesses, one of which is formed as cooling channel that is impacted with a coolant using a cooling device. A single cooling circuit is provided for each recess.; An independent claim is included for a method for producing silicon blocks.

: http://publica.fraunhofer.de/documents/N-297820.html