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Direct UV-imprinting of hybrid-polymer photonic microring resonators and their characterization

 
: Kirchner, R.; Finn, A.; Landgraf, R.; Nueske, L.; Teng, L.C.; Vogler, M.; Fischer, W.-J.

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Journal of Lightwave Technology 32 (2014), No.9, pp.1674-1681
ISSN: 0733-8724
Deutsche Forschungsgemeinschaft DFG
GRK1401
Bundesministerium für Bildung und Forschung BMBF
03FPF00041
English
Journal Article
Fraunhofer IPMS ()

Abstract
The direct patterning of hybrid-polymer microring resonators with minimal residual layers by UV-assisted nanoimprint lithography is reported. The proposed stamp-and-repeat technology requires no post-processing. The imprint polymer was applied by spin-coating as a 130-150 nm thin initial film for an optimized processing. The importance of the initial film thickness is discussed in detail. Aspect ratios of more than 5:1 were realized with 2 mu m high ridge-waveguides and sub-400 nm coupling gaps on maximal 130 nm thin residual layers. The achieved ratio of structure height to residual layer thickness of 15.4 (2 mu m versus 130 nm) was much larger than the typical values in high-resolution imprinting and superseded the removal of the residual layer completely. The resonators are thought as biosensor transducers. High quality devices with Q-factors up to 13 000 were produced with a minimal set of process steps.

: http://publica.fraunhofer.de/documents/N-296326.html