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Sputter deposition of stress controlled piezoelectric AlN and AlScN films for ultrasonic and energy harvesting applications

 
: Barth, Stephan; Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Herzog, Thomas; Walter, Susan; Heuer, Henning

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Institute of Electrical and Electronics Engineers -IEEE-; IEEE Ultrasonics, Ferroelectrics, and Frequency Control Society:
IEEE International Ultrasonics Symposium, IUS 2013. Vol.2 : Prague, Czech Republic, 21 - 25 July 2013
Piscataway, NJ: IEEE, 2013
ISBN: 978-1-4673-5685-5
ISBN: 978-1-4673-5686-2
ISBN: 978-1-4673-5684-8
pp.1351-1353
International Ultrasonics Symposium (IUS) <2013, Prague>
English
Conference Paper
Fraunhofer FEP ()
Fraunhofer IKTS ()
AlN; AlScN; stress control; sputter deposition; piezoelectric

Abstract
This paper will report on the deposition and characterization of piezoelectric AlN and AlXSc1-XN layers. A special focus is on the characterization regarding the mechanical stress in the films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/BAW filters. To demonstrate the potential in ultrasonic applications, the pulse echo method was used.

: http://publica.fraunhofer.de/documents/N-294591.html