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Efficient fabrication of complex nano-optical structures by E-beam lithography based on charakter projection

: Zeitner, Uwe Detlef; Harzendorf, Torsten; Fuchs, Frank; Banasch, Michael; Schmidt, Holger; Kley, Ernst-Bernhard


Freymann, Georg von ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advanced fabrication technologies for micro/nano optics and photonics VII : 3 - 5 February 2014, San Francisco, California, United States
Bellingham, WA: SPIE, 2014 (Proceedings of SPIE 8974)
ISBN: 978-0-8194-9887-8
Paper 89740G
Conference "Advanced Fabrication Technologies for Micro/Nano Optics and Photonics" <7, 2014, San Francisco/Calif.>
Conference Paper
Fraunhofer IOF ()
electron-beam lithography; nano-optics; diffractive elements; character projection; plasmonics

The fabrication of complex nano-optical structures for plasmonics, photonic-crystals, or meta-materials on application relevant areas by electron-beam lithography requires a highly parallel writing strategy. In case of periodic pattern as they are found in most of the mentioned optical elements this can be achieved by a so called character projection writing principle where complex exposure pattern are coded in a stencil mask and exposed with a single shot. Resulting shotcount and writing time reductions compared to standard Variable-Shaped-Beam exposures can be in the order of 100...10000. The limitation in flexibility by using hard-coded exposure shapes can be overcome by implementing the character projection principle with a highly precise motorized aperture stage capable of carrying several 1000 different apertures. Examples of nano-optical elements fabricated with the new character projection principle are presented.