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Chiral nanomaterial fabrication by means of on-edge lithography

: Dietrich, Kay; Lehr, Dennis; Puffky, Oliver; Kley, Ernst-Bernhard; Tünnermann, Andreas


Wallow, T.I. ; Society of Photo-Optical Instrumentation Engineers -SPIE-, Bellingham/Wash.:
Advances in Patterning Materials and Processes XXXI : San Jose, California, USA; February 2014
Bellingham: SPIE, 2014 (Proceedings of SPIE 9051)
ISBN: 978-0-8194-9974-5
Paper 90510D
Conference "Advances in Patterning Materials and Processes" <31, 2014, San Jose/Calif.>
Conference Paper
Fraunhofer IOF ()
nanostructure fabrication; electron-beam lithography; plasmonics; chiral media

We present an approach named on-edge lithography, where chiral shaped pattern are yield through the combination of electron beam lithography in variable shape or cell projection mode and shadow evaporation. On one hand, we describe the process and reveal advantages when opposed to other common nano fabrication techniques. On the other hand, we also figure out challenges for successful technological application. Finally we demonstrate the useability of the process by revealing SEM pictures of a couple of realized chiral nanostructures. In order to evaluate the process we further present optical measurements. We find peak values of circular dichroism of 44% at 420 THz (715 nm). The process is applicable on large scale and to the fullest compatible with other nano-lithographic tools e.g. nanoimprint replication techniques, thus pushing chiral nanomaterial fabrication towards highest efficiency.